240W Solar Panels for Home Use Solar Power System

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Min Order Qty:
10000 watt
Supply Capability:
20000000 watt/month

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Solar panel refers to a panel designed to absorb the sun's rays as a source of energy for generating electricity or heating. A PV module is a packaged, connected assembly of typically 6×10 solar cells. Solar PV panels constitute the solar array of a photovoltaic system that generates and supplies solar electricity in commercial and residential applications.


 Main Characteristic

1.Manufactured according to international quality and Environment Management

    System (ISO9001, ISO14001)

2. By the high transmittance, low iron tempered glass, anti-aging of the EVA(polyethylene - vinyl acetate), high-performance crystalline silicon solar cells, good Weather resistance TPT (fluoroplastics composite membrane) by pyramid , has a good Weather resistance and anti-UV, hail, water-proof capacity.

3.  OEM and customerized package are accepted

4. High efficiency crystalline silicon solar cells


Quality warranty

1.10 years limited warranty on material and workmanship

2. more than 90% power output in 10 years

3. more than 80% power output in 25 years


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240W Solar Panels for Home Use Solar Power System

240W Solar Panels for Home Use Solar Power System

240W Solar Panels for Home Use Solar Power System

240W Solar Panels for Home Use Solar Power System

240W Solar Panels for Home Use Solar Power System


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Q:Hydrogen passivation mechanism of hydrogen fluoride HF in silicon wafer RCA cleaning process
Wire cut damage layer thickness of 10 microns.Generally use 20% alkali solution in the corrosion condition at 90 C
Q:What are the raw materials of silicon wafers
Polysilicon material:1 solar polysilicon: 6N, P2 head tails: P3 broken semiconductor wafer: P type, arc type debrisPrice: $200 / kg
Q:How much harm silicon on the human body
Silicon is a semiconductor material, if it is to detect the bare silicon wafer, then there is no harm
Q:How to make monocrystalline silicon solar cells
Phosphate glassThe process is used for solar cell production in the manufacturing process, through chemical etching silicon that is immersed in hydrofluoric acid solution, complexes six fluorosilicic acid to produce chemical reaction to produce soluble phosphorus silicon glass layer, a diffusion system to remove the node after the formation of the surface of the silicon wafer. In the diffusion process, POCL3 reacts with O2 to form P2O5 on the surface of silicon wafer. P2O5 reacted with Si to produce SiO2 and phosphorus atoms, which form a layer of phosphorus containing SiO2 on the surface of the silicon wafer. Removing phosphorosilicate glass equipment is generally composed of a main body, a cleaning tank, manipulator, servo drive system, electric control system and the automatic mixing acid system components, the main power source of hydrofluoric acid, nitrogen, compressed air, water, wastewater and exhaust heat. Hydrofluoric acid is capable of dissolving silicon dioxide because of the reaction of hydrofluoric acid and silica to produce volatile four fluorinated silicon gas. If the hydrofluoric acid is too heavy, the reaction of four fluorinated silicon will further react with hydrofluoric acid to produce soluble complex and the material of the six fluorine acid.
Q:What is the silicon area of the 125 diagonal of a single crystal of 160?
160 refers to the diagonal length of the chamfer, you draw a map can be calculated, the specific algorithm is:
Q:How to avoid or reduce the fragmentation of thin silicon wafers without wax polishing?
You can use the U.S. ZeroMicron wax free polishing template to solve the problem of non wax polishing fragments
Q:How to do on the silicon wafer
The general use of ultrasonic and pre cleaning (pickling) can be solved
Q:After cutting a few chips, mortar density is getting lower and lower
Iron powder and silica fume more and more, the density should be more and more big, unless it is your water content is higher and higher
Q:What is a silicon wafer cutting edge material?
Online cutting process, the cutting fluid (usually polyethylene glycol) and cutting edge material sand spray with the fall in thin steel wire by thin steel wire net, high speed, make the mortar in cutting edge material and pressed online silicon rod or a silicon ingot surface high speed grinding,
Q:What is the meaning of a cleaning in a semiconductor silicon wafer process? RCA?
() APM (SC-1): NH4OH/H2O2 /H2O 30 ~ 80 DEG C due to the action of H2O2, the surface of the silicon wafer has a natural oxide film (SiO2), which is hydrophilic, and the surface of the silicon wafer can be soaked with the cleaning liquid. Because the natural oxide layer on the surface of silicon wafer and the Si on the surface of silicon wafer are corroded by NH 4OH, the particles attached to the surface of the silicon wafer will fall into the cleaning liquid, so as to achieve the purpose of removing particles. At the same time, the H2O 2 forms a new oxide film on the surface of the oxidized silicon wafer when the NH4OH is etched on the surface of the silicon wafer.

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