Solar Cell High Quality A Grade Cell Monorystalline 5v 19.2%

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Specifications

hot sale solar cell 
1.16.8%~18.25% high efficiency 
2.100% checked quality 
3.ISO9001/ISO14001/TUV/CE/UL 
4.stable performance 


We can offer you the best quality products and services, don't miss !

 

POLY6'(156*156)

Polycrystalline Silicon Solar cell

 

Physical  Characteristics   

 

Dimension:     156mm×156mm±0.5mm

Diagonal:          220mm±0.5mm

Thickness(Si):  200±20 μm

 

Front(-)                                                              Back(+)

Blue anti-reflecting coating (silicon nitride);            Aluminum back surface field;

1.5mm wide bus bars;                                            2.0mm wide soldering pads;

Distance between bus bars: 51mm .                     Distance between bus bars :51mm .

 

Electrical Characteristics 

Efficiency(%)

18.00

17.80

17.60

17.40

17.20

16.80

16.60

16.40

16.20

16.00

15.80

15.60

Pmpp(W)

4.33

4.29

4.24

4.19

4.14

4.09

4.04

3.99

3.94

3.90

3.86

3.82

Umpp(V)

0.530

0.527

0.524

0.521

0.518

0.516

0.514

0.511

0.509

0.506

0.503

0.501

Impp(A)

8.159

8.126

8.081

8.035

7.990

7.938

7.876

7.813

7.754

7.698

7.642

7.586

Uoc(V)

0.633

0.631

0.628

0.625

0.623

0.620

0.618

0.617

0.615

0.613

0.611

0.609

Isc(A)

8.709

8.677

8.629

8.578

8.531

8.478

8.419

8.356

8.289

8.220

8.151

8.083

 

Solar Cell High Quality  A Grade Cell Monorystalline 5v 19.2%


MONO5'(125*125mm)165

Monocrystalline silicon solar cell

 

Physical  Characteristics 

Dimension: 125mm×125mm±0.5mm

Diagonal: 165mm±0.5mm

Thickness(Si): 200±20 μm

 

Front(-)                                                                         Back(+)                                                                                                                                                                                                                                    

Blue anti-reflecting coating(silicon nitride);                        Aluminum back surface field;

1.6mmwide bus bars;                                                        2.5mm wide soldering pads;

Distance between bus bars: 61mm .                                Distance between bus bars :61mm .

 

Electrical Characteristics 

 

Efficiency(%)

19.40

19.20

19.00

18.80

18.60

18.40

18.20

18.00

17.80

17.60

17.40

17.20

Pmpp(W)

2.97

2.94

2.91

2.88

2.85

2.82

2.79

2.76

2.73

2.70

2.67

2.62

Umpp(V)

0.537

0.535

0.533

0.531

0.527

0.524

0.521

0.518

0.516

0.515

0.513

0.509

Impp(A)

5.531

5.495

5.460

5.424

5.408

5.382

5.355

5.328

5.291

5.243

5.195

4.147

Uoc(V)

0.637

0.637

0.636

0.635

0.633

0.630

0.629

0.629

0.628

0.626

0.626

0.625

Isc(A)

5.888

5.876

5.862

5.848

5.839

5.826

5.809

5.791

5.779

5.756

5.293

5.144

 

Solar Cell High Quality  A Grade Cell Monorystalline 5v 19.2%

 

FAQ:

Q:How can i get some sample?

A:Yes , if you want order ,sample is not a problem.

 

Q:How about your solar panel efficency?

A: Our product  efficency  around 17.25%~18.25%.

 

Q:What’s the certificate you have got?

A: we have overall product certificate of ISO9001/ISO14001/CE/TUV/UL


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Q:Hydrogen passivation mechanism of hydrogen fluoride HF in silicon wafer RCA cleaning process
When the concentration of NaOH is higher than 20%W/V, the corrosion rate depends mainly on the temperature of the solution, but not on the actual concentration of the alkali solution.Removal of surface oxide layer on silicon wafer by HF:
Q:I grew Ag particles on a silicon wafer, about a few hundred nanometers in size
And then use the copper net fishing, so that particles attached to the copper network.
Q:How to make a resistor on a silicon chip (integrated circuit)
The site is general one-sided, to consult the detailed understanding of literature, over the wall out to find it, say one thirty,
Q:How to deal with silicon wafer annealing
Another fact: if the same "complement", can be understood as: oxygen from the surface after the removal of impurities, near the surface of the reduced defects is also reduced, the mean free path of carrier mobility increases, also increases, which leads to the decrease of resistivity.
Q:The significance of silicon wafer heat treatment
The significance of silicon wafer heat treatmentHeat treatment temperature requirements: 650 + 5 c;The purpose of heat treatment is to restore the true resistivity of Czochralski silicon wafers;
Q:What is a silicon wafer
Is usually used in high-end IC and special IC, such as Si on insulator (SOI) wafer. In the production process of IC, need some wafer to test the status of the production process, such as the level of particle, the etching rate, defect rate and so on, these are often called wafer control chip, the control plate is also used with normal production batch process together to test the quality condition of a process, such as the CVD film thickness. In the production equipment maintenance or repair, immediately production batch of wafer, easy to cause the scrap, and usually use some very low cost wafer to run the process to determine the quality of maintenance or repair work, which is usually called wafer dummy wafer, of course, sometimes dummy wafer also can be used in the normal production process, such as machine must wafer to process a number of problems with dummy wafer complement, and some machines must be in the process of a certain number of wafer A form of dummy run, otherwise the process can not guarantee the quality and so on many wafer and so on can be called dummy. block basically can be regarded as a kind of.Dummy wafer dummy, wafer control chip, a guard sheet usually can be recycled.
Q:I would like to ask what the purpose of the use of semiconductor silicon wafers, doped with boron ah?
PN junction has a single conductivity, semiconductor rectifier is made of the characteristics of the PN junction. Such as: large scale integrated circuit is under the high temperature for the impurity required in a certain way (thermal diffusion and ion implantation) incorporated into the silicon wafer surface layer, and make it reach the required quantity and distribution, manufacturing a PN junction, interconnect and ohmic contact to complete.
Q:The production of silicon units do front-line production workers harmful to the body
There are still some damage, some of the silicon wafer plant dust, strong acid, alkali, more depends on the configuration of the factory environment and labor insurance supplies
Q:How to avoid or reduce the fragmentation of thin silicon wafers without wax polishing?
I don't know how your employees operateYou can put a small bubble in the insertion box below if it is convenient. Can play a buffer role
Q:What is the meaning of a cleaning in a semiconductor silicon wafer process? RCA?
RCA cleaning is to use the RCA method to clean.RCA is a typical and commonly used wet chemical cleaning method:

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