260W Solar Panels for Home Use Solar Power System

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10000 watt
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20000000 watt/month

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Solar panel refers to a panel designed to absorb the sun's rays as a source of energy for generating electricity or heating. A PV module is a packaged, connected assembly of typically 6×10 solar cells. Solar PV panels constitute the solar array of a photovoltaic system that generates and supplies solar electricity in commercial and residential applications.

 Main Characteristic

1.Manufactured according to international quality and Environment Management

    System (ISO9001, ISO14001)

2. By the high transmittance, low iron tempered glass, anti-aging of the EVA(polyethylene - vinyl acetate), high-performance crystalline silicon solar cells, good Weather resistance TPT (fluoroplastics composite membrane) by pyramid , has a good Weather resistance and anti-UV, hail, water-proof capacity.

3.  OEM and customerized package are accepted

4. High efficiency crystalline silicon solar cells

Quality warranty

1.10 years limited warranty on material and workmanship

2. more than 90% power output in 10 years

3. more than 80% power output in 25 years

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260W Solar Panels for Home Use Solar Power System

260W Solar Panels for Home Use Solar Power System

260W Solar Panels for Home Use Solar Power System

260W Solar Panels for Home Use Solar Power System

260W Solar Panels for Home Use Solar Power System

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Q:How is the silicon chip integrated circuit?
Based on TTL series integrated circuit as an example, from silicon to process integrated circuit: cut off from a monocrystalline silicon chip, polished - polishing - oxidation - lithography - diffusion - epitaxial buried layer - oxidation - oxidation - diffusion - isolation lithography lithography - base diffusion - oxidation lithography - emitter diffusion vacuum aluminizing - sintering (ohmic contact lithography) - at the initial test procedure is done.
Q:The significance of silicon wafer heat treatment
2, heat treatment of several temperature interval concept:Thermal donor: 350-550 degrees Celsius, 450 degrees Celsius450 C after heat treatment (or equivalent effect, such as the cooling of a single crystal in a furnace), the resistivity of the N type sample can be decreased and the resistivity of the P type sample is increased, as is the introduction of a certain number of donor phenomena. This is due to the temperature of the dissolved oxygen atoms in the formation of complex (SiO4) caused by the thermal donor, the resistivity of silicon and oxygen content of the four side is inversely proportional to.New donor: 550-800 DEG C, on behalf of the temperature of 650 degrees Celsius
Q:Begged monocrystalline silicon rod is to use what tools and equipment to cut into silicon
Common cutting methods for diamond wire cutting and sand cutting
Q:I would like to ask the solar cell (silicon) production process is the principle of how
Two, the surface of cashmereThe preparation of single crystal silicon wafer is the use of anisotropic etching of silicon on the surface of the silicon per square centimeter to form several million square pyramidal structure, namely, the Pyramid structure. Due to the multiple reflection and refraction of incident light on the surface, the absorption of light is increased, and the short circuit current and conversion efficiency are improved. Anisotropic etching of silicon in alkaline solution liquid is usually hot, available alkali sodium hydroxide, potassium hydroxide, lithium hydroxide and ethylenediamine etc.. Most of them were prepared by using dilute sodium hydroxide solution with a concentration of about 1%, and the corrosion temperature was 70-85. In order to obtain a uniform texture, but also in the solution add alcohols such as ethanol and isopropanol as complexing agent to accelerate the corrosion of silicon. In the preparation of velvet, the silicon chip must be first surface corrosion, alkaline or acidic etching solution to about 20 ~ 25 m, corrosion in the face, the general chemical cleaning. After surface preparation of silicon wafers are not suitable for long-term storage in the water, in order to prevent contamination, should be spread as soon as possible.
Q:What is the surface hardness of monocrystalline silicon and polycrystalline silicon wafers
At this time, the hardness and elastic modulus of the oxide layer on the surface of monocrystalline silicon wafer were measured, which were about 10.2 GPa and 140.3 GPa, respectively. When the contact depth is about 32 ~ 60NM, silicon wafer contact stiffness and contact depth into a non linear relation between the hardness and elastic modulus increased sharply with the contact depth, show that the hardness and elastic modulus of monocrystalline silicon oxide film surface layer is affected by the matrix material.
Q:After wafer cleaning, how to change the film?
Quality solutionCleaning method(a) RCA cleaning:RCA pioneered by Werner Kern in the N.J.Princeton RCA laboratory in 1965, and hence the name.RCA cleaning is a typical wet chemical cleaning.RCA cleaning is mainly used for cleaning the surface film, organic particles and metal contamination.1, particle cleaningThe main APM removal of silicon surface particles (also known as SC1) cleaning solution (NH4OH + H2O2 + H2O) to APM in the cleaning. The cleaning solution, due to the effects of H2O2, the silicon surface has a layer of natural oxide film (SiO2), a hydrophilic surface and between silicon particles can soaking cleaning liquid, silicon surface the natural oxide film and a silicon wafer surface by NH4OH corrosion, the particles will fall into the cleaning solution. The corrosion rate and the particle removal amount of silicon surface, for removing particles, corrosion must be a certain amount. In the cleaning solution, because the potential of silicon surface is negative, and most of the particles are repulsive force to prevent the adsorption of particles to the silicon surface.
Q:How much a piece of silicon on the board
Since a single voltage is fixed, the resulting current size determines the power of a battery, the current per tablet produced is not fixed, with the conversion rate of the conversion rate, high current is large, whereas small;
Q:Silicon wafer cleaning after the two sides of the upper and lower grille also has a basket of flowers (Bai Yin)
I used to solve this problem for several months before the DOE experiment to solve, so it is very difficult, and there is no relationship with the bubble, and now the cleaning process does not need to bubble
Q:How to detect the surface finish of photovoltaic silicon wafers, what equipment?
Do you want to check the surface roughness or do you want to clean it? These two are not the same,
Q:What are some of the silicon wafer factory
4 polycrystalline casting workshopassistantIngot casting and painting team leaderPolycrystalline operatorCrucible spray, auxiliarySubtotal5 cutting workshop directorDeputy directorassistantCut the monitorRoll monitorCutting and grinding operation staffMulti line monitorMulti line operatorViscose monitorViscose operatorMortar mixerMortar mixing operatorRecorderConsignorSubtotal

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