250W Solar Panels for Home Use Solar Power System

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10000 watt
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20000000 watt/month

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Solar panel refers to a panel designed to absorb the sun's rays as a source of energy for generating electricity or heating. A PV module is a packaged, connected assembly of typically 6×10 solar cells. Solar PV panels constitute the solar array of a photovoltaic system that generates and supplies solar electricity in commercial and residential applications.

 Main Characteristic

1.Manufactured according to international quality and Environment Management

    System (ISO9001, ISO14001)

2. By the high transmittance, low iron tempered glass, anti-aging of the EVA(polyethylene - vinyl acetate), high-performance crystalline silicon solar cells, good Weather resistance TPT (fluoroplastics composite membrane) by pyramid , has a good Weather resistance and anti-UV, hail, water-proof capacity.

3.  OEM and customerized package are accepted

4. High efficiency crystalline silicon solar cells

Quality warranty

1.10 years limited warranty on material and workmanship

2. more than 90% power output in 10 years

3. more than 80% power output in 25 years

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250W Solar Panels for Home Use Solar Power System

250W Solar Panels for Home Use Solar Power System

250W Solar Panels for Home Use Solar Power System

250W Solar Panels for Home Use Solar Power System

250W Solar Panels for Home Use Solar Power System

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Q:How to convert photovoltaic silicon MW
156 single crystal (chamfer 200) area: 238.95125 single crystal (chamfer 165) area: 154.831MW=1 * (10 negative) W
Q:What is the use of silicon?
List of productsPolycrystalline silicon ingot (Figure) silicon wafer (Figure)Battery (Figure) aluminum alloy color frame components (Figure)Epoxy resin encapsulation component photoelectric curtain wall component (all glass component)Solar lawn lamp (map) solar garden lamp (Figure)Solar communication power supply (map) solar mobile power supply (map)
Q:Process flow of wafer wafer ultrasonic cleaning machine?
Solar silicon wafer surface plasma cleaning processResidual plasma cleaning method of particles on silicon wafer surface, which comprises the following steps: firstly, gas flushing process, and then the gas plasma glow. The plasma cleaning method for removing particles of silicon surface easy control, thorough cleaning, no residual reactants, the process gas, non-toxic, low cost, small amount of labor, work efficiency high.
Q:How to make monocrystalline silicon solar cells
Phosphate glassThe process is used for solar cell production in the manufacturing process, through chemical etching silicon that is immersed in hydrofluoric acid solution, complexes six fluorosilicic acid to produce chemical reaction to produce soluble phosphorus silicon glass layer, a diffusion system to remove the node after the formation of the surface of the silicon wafer. In the diffusion process, POCL3 reacts with O2 to form P2O5 on the surface of silicon wafer. P2O5 reacted with Si to produce SiO2 and phosphorus atoms, which form a layer of phosphorus containing SiO2 on the surface of the silicon wafer. Removing phosphorosilicate glass equipment is generally composed of a main body, a cleaning tank, manipulator, servo drive system, electric control system and the automatic mixing acid system components, the main power source of hydrofluoric acid, nitrogen, compressed air, water, wastewater and exhaust heat. Hydrofluoric acid is capable of dissolving silicon dioxide because of the reaction of hydrofluoric acid and silica to produce volatile four fluorinated silicon gas. If the hydrofluoric acid is too heavy, the reaction of four fluorinated silicon will further react with hydrofluoric acid to produce soluble complex and the material of the six fluorine acid.
Q:Solar silicon wafer cutting fluid can burn explosion?
2, the glass can not be used as the bearing plate of the crystal rod, if the use of graphite plate, grinding down the silicon powder containing a certain amount of graphite, it is difficult to deal with the recovery of silica fume3, can only be used for single crystal cutting4, the cost of the problem, and now the price of diamond wire fell faster, diamond wire cutting costs should be close to the cost of cutting free abrasive
Q:Why do monocrystalline silicon chamfer? Polysilicon film?
Chamfering is for this purpose, grinding and polishing are also for this purpose. As a single crystal practitioners, it is recommended that you take a look at the processing technology of silicon single crystal wafer > this book, written by Zhang Juezong, more comprehensive
Q:How to extract silicon from silicon wafers
Annealing: double position hot oxidation furnace after nitrogen purging, infrared heating to 300~500 DEG C, silicon wafer surface and oxygen react, so that the surface of silicon dioxide protection layer.
Q:How to calculate the conversion efficiency of monocrystalline silicon
Solar cell efficiency = (open circuit voltage * short-circuit voltage * fill factor) / (battery area * light amplitude) *100%Light intensity - AM1.5 as the standard, that is 1000W/m2Proportion of dark current - Irev>6 cell ratioThe proportion of low efficiency tablets - the proportion of P156Eff<14.5% batteries
Q:After wafer cleaning, how to change the film?
2, surface metal cleaning(1) HPM (SC22) cleaning (2) DHF cleaningMetal contamination of silicon surface has two kinds of adsorption and desorption mechanism: (1) compared with the negatively charged silicon high metal such as Cu, Ag, Au, from the silicon surface to capture electron on the surface of the silicon direct formation of chemical bonds. Has a high redox potential of the solution to obtain electrons from these metals, resulting in metal the ionized form dissolved in the solution, so that this type of metal removed from the silicon surface. (2) compared with the negatively charged silicon low metal, such as Fe, Ni, Cr, Al, Ca, Na, K can be easily ionized in solution and deposited on the silicon wafer surface natural oxide film or a chemical oxide film on these metals in dilute HF solution with a natural oxide film or a chemical oxide film is easily removed.3, organic cleaningThe removal of organic silicon surface cleaning fluid used is SPM.SPM with high oxidative capacity, metal oxide can be dissolved in solution, and the oxidation of organic compounds to produce CO2 and.SPM cleaning water can remove the surface of silicon wafer heavy organic contamination and some metal, but when organic contamination is heavy will make carbonization of organic matter and difficult to remove by SPM. After cleaning, the silicon surface residual sulfide, the sulfide particles is difficult to use to water wash out.
Q:How do we use the scanning electron microscope
After wiping with cotton wool, wash ear ball can be dried.Some of the words can be placed in alcohol solution ultrasonic cleaning, the effect is almost.

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