245W Solar Panels for Home Use Solar Power System

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10000 watt
Supply Capability:
20000000 watt/month

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Solar panel refers to a panel designed to absorb the sun's rays as a source of energy for generating electricity or heating. A PV module is a packaged, connected assembly of typically 6×10 solar cells. Solar PV panels constitute the solar array of a photovoltaic system that generates and supplies solar electricity in commercial and residential applications.

 Main Characteristic

1.Manufactured according to international quality and Environment Management

    System (ISO9001, ISO14001)

2. By the high transmittance, low iron tempered glass, anti-aging of the EVA(polyethylene - vinyl acetate), high-performance crystalline silicon solar cells, good Weather resistance TPT (fluoroplastics composite membrane) by pyramid , has a good Weather resistance and anti-UV, hail, water-proof capacity.

3.  OEM and customerized package are accepted

4. High efficiency crystalline silicon solar cells

Quality warranty

1.10 years limited warranty on material and workmanship

2. more than 90% power output in 10 years

3. more than 80% power output in 25 years

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245W Solar Panels for Home Use Solar Power System

245W Solar Panels for Home Use Solar Power System

245W Solar Panels for Home Use Solar Power System

245W Solar Panels for Home Use Solar Power System

245W Solar Panels for Home Use Solar Power System

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Q:The production of silicon units do front-line production workers harmful to the body
Please also note: as long as it is in the production of factory work, there are more or less some occupation hazards, such as peripheral equipment operation noise, dust production, if the production site without the necessary protective equipment is also possible occupation disease.So my answer is only from the perspective of occupational protection.
Q:Polished silicon wafers can be most SEM substrates
There are many kinds of polishing, mechanical polishing, chemical polishing, electrolytic polishing, ultrasonic polishing, fluid polishing, magnetic abrasive polishing!Beijing there throwing a new type of practical technology, science and technology can improve the Liz polishing efficiency and so on.
Q:Silicon chip cutting, NTC442 machine, a knife can cut the number of slices
Do not stick stick with the United States and the United States, the line will be glued to the line together. With the kind of 3M model of the United States and rubber repair jumper glue will not stick on the line, if the jumper is too much can be inserted in the United States and the United States to close the line has been going to the end.
Q:Why do you want to make the wafer bigger?
Because each layer is insulated by silicon dioxide, it is equivalent to a capacitor structure. The larger the span, the greater the capacity of the wiring. The higher the frequency, the more serious side effects such as the integral effect of the long distance transmission. Basically thought GHz must use the following line width.18 technology. Chip size also affects power consumption. With the same mask and the same operating frequency, the smaller the line width, the smaller the voltage. The power consumption is proportional to the square of the voltage. Want to pursue low power you have to honestly narrow the line width. The semiconductor industry in the world are going to kill red eye, if we do not have shortcut yiwofeng to dive in.
Q:What is the role of the semiconductor wafer
The main role of the glue is coated with photoresist coated flat, the use of high-speed rotation of the centrifugal force
Q:Hydrogen passivation mechanism of hydrogen fluoride HF in silicon wafer RCA cleaning process
0.5 ~ 1min in order to achieve the effect of removing the damage layer, at this timeCorrosion rate can reach 6 to 10um/min.In the polishing process to remove the damage layer on the basis to try to reduce, to prevent corrosion of the wafer was too thin.
Q:What is the surface hardness of monocrystalline silicon and polycrystalline silicon wafers
When the contact depth is about 20 ~ 32nm, the contact stiffness and the contact depth of the single crystal silicon wafer are linear,
Q:The purpose and means of chemical etching of silicon wafers?
What are the means of chemical etching of silicon: 1 acid corrosion of 2 alkaline corrosion
Q:Process flow of wafer wafer ultrasonic cleaning machine?
Plasma cleaning method, which is characterized in that the process parameters of gas flushing process is: the chamber pressure of 15 mTorr, process gas flow 300sccm, time 3S; process parameters of starting process is: the chamber pressure of 15 mTorr, process gas flow on the electrode 300sccm, power 300W, time Ss
Q:What is a semiconductor silicon device tester
First of all the circuit insulator carrier plays a supporting role in the insulation layer of the circuit is called the substrate (like P type semiconductor) to participate in the work of the collection circuit to take the CMOS process Nmos substrate are connected with the substrate

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